Our partnerDMO

Photo lithography systems

MicroWriter from Durham Magneto Optics (DMO)

The MicroWriter 3 Pro is a direct-write photo lithography system. It is flexible and powerful and offers everything you need for high resolution combined with fast processing.

MicroWriter 3 Baby is the smallest optical lithography machine in the world and is offered at an affordable price.

  • High resolution
  • Fast writing speed
  • Easy-to-use
  • Cost effective
  • Flexible configuration

Further information

The MicroWriter 3 Pro works with a 385 nm photo diode which can be used for g-, h- and i-line resists (positive and negative and SU-8). The system provides four different resolutions which easily can be switched via the software (0.6 µm, 1 µm, 2 µm and 5 µm). As an option you can add 0.4 µm resolution. MicroWriter 3 Pro includes an optical profilometer and a wafer inspection tool.

Additionally one can add a 405 nm or 365 nm photo diode or the backside alignment option to the system.

The baby, the baby plus and the Mesa system are using a 405 nm diode as standard which can be change with a 385 nm or 365 nm.

Each system can be upgraded to the next level at any later stage which makes the MicroWriter family the most flexible direct write lithography platform in the market.


Microwriter SpecificationML3 BabyML3 Baby PlusML3 MesaML3 Pro
Maximum substrate size [mm]155 x 155 x 7155 x 155 x 7155 x 155 x 7230 x 230 x 15
Maximum writing area [mm]149 x 149149 x 149149 x 149195 x 195
Exposure resolutions [µm]11 and 50.6, 1, 50.6, 1, 2, 5 (0.4 as option)
Surface tracking autofocus systemYesYesYesYes
Greyscale lithographyYesYesYesYes
Alignment microscope objectivesx10x3 and x10x3, x10, x20x3, x5, x10, x20 (x50 as option)
Automatic lens changer for exposure resolution and alignment microscopeNoYesYesYes
Backside alignmentNoNoNoAvailable as option
Exposure wavelength [nm]405 (385 and 365 as option)405 (385 and 365 as option)405 (385 and 365 as option)385 (365 nm as option)
Maximum writing speed50 mm2/minute at 1 µm50 mm2/minute at 1 µm 180 mm2/minute at 5 µm17 mm2/minute at 0.6 μm, 50 mm2/minute at 1 μm 180 mm2/minute at 5 μm17 mm2/minute at 0,6 µm, 50 mm2/minute at 1 µm, 120 mm2/minute at 2 µm , 180 mm2/minute at 5 µm
Overlay alignment accuracy at best resolution [µm]±2±1±1±0,5
Minimum addressable grid [nm]200200100100
Motion stage minimum XY step size [nm]1515154
Optical surface profiler Z resolution [nm]not applicalble200200100
Automatic wafer inspection toolNoYesYesYes
Virtual mask aligner toolNoAvailable as optionAvailable as optionYes
Temperature stabilized enclosureNoAvailable as optionAvailable as optionYes
Supplied with vibration isolating optical tableNoNoNoYes
Mask design softwareOpen source KLayout supplied. Clewin available as optionOpen source KLayout supplied. Clewin available as optionOpen source KLayout supplied. Clewin available as optionClewin supplied
Can be upgraded?YesYesYesNo


Microelectronics and semiconductors
Microfluidics and lab-on-a-chip
Materials science
Graphene and other 2-dimensional materials
Loading and exposing a sample

Video: loading and exposing a sample

Developing and viewing a sample Video: developing and viewing a sample


MicroWriter ML 3 Pro
MicroWriter ML 3 Pro
MicroWriter ML 3 Baby
MicroWriter ML 3 Baby
MicroWriter ML 3 Baby Plus
MicroWriter ML 3 Baby Plus
MicroWriter ML 3 Mesa
MicroWriter ML 3 Mesa


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Dr. Simone Paziani
Dr. Simone Paziani


Quantum Design s.r.l.

Via Francesco Sapori, 27
00143 Roma

Phone:+39 06 5004204
Fax:+39 06 5010389
Simone PazianiProduct Manager
+39 06 5004204