Photo lithography systemsMicroWriter from Durham Magneto Optics (DMO)
The MicroWriter 3 Pro is a direct-write photo lithography system. It is flexible and powerful and offers everything you need for high resolution combined with fast processing.
MicroWriter 3 Baby is the smallest optical lithography machine in the world and is offered at an affordable price.Features
- High resolution
- Fast writing speed
- Cost effective
- Flexible configuration
The MicroWriter 3 Pro works with a 385 nm photo diode which can be used for g-, h- and i-line resists (positive and negative and SU-8). The system provides four different resolutions which easily can be switched via the software (0.6 µm, 1 µm, 2 µm and 5 µm). As an option you can add 0.4 µm resolution. MicroWriter 3 Pro includes an optical profilometer and a wafer inspection tool.
Additionally one can add a 405 nm or 365 nm photo diode or the backside alignment option to the system.
The baby, the baby plus and the Mesa system are using a 405 nm diode as standard which can be change with a 385 nm or 365 nm.
Each system can be upgraded to the next level at any later stage which makes the MicroWriter family the most flexible direct write lithography platform in the market.
|Microwriter Specification||ML3 Baby||ML3 Baby Plus||ML3 Mesa||ML3 Pro|
|Maximum substrate size [mm]||155 x 155 x 7||155 x 155 x 7||155 x 155 x 7||230 x 230 x 15|
|Maximum writing area [mm]||149 x 149||149 x 149||149 x 149||195 x 195|
|Exposure resolutions [µm]||1||1 and 5||0.6, 1, 5||0.6, 1, 2, 5 (0.4 as option)|
|Surface tracking autofocus system||Yes||Yes||Yes||Yes|
|Alignment microscope objectives||x10||x3 and x10||x3, x10, x20||x3, x5, x10, x20 (x50 as option)|
|Automatic lens changer for exposure resolution and alignment microscope||No||Yes||Yes||Yes|
|Backside alignment||No||No||No||Available as option|
|Exposure wavelength [nm]||405 (385 and 365 as option)||405 (385 and 365 as option)||405 (385 and 365 as option)||385 (365 nm as option)|
|Maximum writing speed||50 mm2/minute at 1 µm||50 mm2/minute at 1 µm 180 mm2/minute at 5 µm||17 mm2/minute at 0.6 μm, 50 mm2/minute at 1 μm 180 mm2/minute at 5 μm||17 mm2/minute at 0,6 µm, 50 mm2/minute at 1 µm, 120 mm2/minute at 2 µm , 180 mm2/minute at 5 µm|
|Overlay alignment accuracy at best resolution [µm]||±2||±1||±1||±0,5|
|Minimum addressable grid [nm]||200||200||100||100|
|Motion stage minimum XY step size [nm]||15||15||15||4|
|Optical surface profiler Z resolution [nm]||not applicalble||200||200||100|
|Automatic wafer inspection tool||No||Yes||Yes||Yes|
|Virtual mask aligner tool||No||Available as option||Available as option||Yes|
|Temperature stabilized enclosure||No||Available as option||Available as option||Yes|
|Supplied with vibration isolating optical table||No||No||No||Yes|
|Mask design software||Open source KLayout supplied. Clewin available as option||Open source KLayout supplied. Clewin available as option||Open source KLayout supplied. Clewin available as option||Clewin supplied|
|Can be upgraded?||Yes||Yes||Yes||No|