The MicroWriter – Powerful photolithography

For more than 10 years, Durham Magneto Optics have been developing budget-friendly and powerful direct-write lithography systems. The latest generation combines the fast speed of a typical Mask Aligner system and the flexibility of a direct-write photolithography system. Fig. 1 shows a schematic of the two systems. The core of our MicroWriter system is the Display Unit which works like the mask of a Mask Aligner. In this case, the patterns to be exposed are digitally created on a computer, which means they can be prepared flexibly and individually. In combination with varying resolutions (0.6 µm, 1 µm, 2 µm and 5 µm), we can realize speed and high resolution in one system.


  • Microelectronics and semiconductor research
  • Spintronics
  • Nanopositioning sensors
  • Microfluidic and Lab-on-a-chip
  • Nanotechnology
  • Materials science
  • Graphene research

Writing speed can reach 180 mm²/minute with an overlay accuracy of +/- 0.5 µm. The edge roughness of the pattern typically lies at 30 nm RMS (see fig. 2). Our system can automatically capture reference points on the substrate surface, and it features a Virtual Mask Aligner mode that is useful for applying contact points on the substrate surface materials. See figures 3 and 4 as examples.


Stéphane Marin
Stéphane Marin


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Quantum Design S.A.R.L.

Avenue de l’Atlantique
Bâtiment Fuji Yama
91940 Les Ulis

Phone:+33 1 69 19 49 49
Stéphane MarinProduct Manager & Service Engineer
01 69 19 49 49
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