In-situ spectroscopic ellipsometer iSE

From Woollam Co.

The iSE is a new in-situ spectroscopic ellipsometer developed for real-time monitoring of thin film processing.  Using our proven technology, the iSE enables users to optimize optical properties of deposited films, control film growth with sub-angstrom sensitivity, and monitor growth kinetics.

  • In-situ
  • Dual rotating element "Ellipsometer"
  • Small and compact
  • Affordable
  • High measurement speed
  • Easy-to-use

Further information

Nearly all in-situ measurement applications require spectroscopic ellipsometry, but for many applications, a spectral range of 400 to 1000nm, like with iSE is completely sufficient. Without compromising on accuracy or precision. With its compact design, the iSE can also be installed at complex deposition chambers with little space available. The high measuring speed allows fast growth monitoring and real-time process control by communication of the powerful CompleteEASE software with the control center of the deposition chamber.


  • Spectral range: 400 nm to 1000 nm
  • Number of wavelengths (measured simultaneously): 190
  • Detector: CCD
  • Data acquisition rate: 0.3 sec (fastest), 1-2 sec (typical)
  • Beam diameter: ~3mm
  • Chamber requirements:
  • Port size: 2.75” CF (1.33” CF optional)
  • Typical port angle (angle of incidence): 60° - 75° ** measured from sample normal


Determining of thin film thickness of single and multi layers
Optical constants
Growth and etch rates
Process kinetics
Surface quality before and after processing
Real-time end-point detection
ALD, CVD, MBE, sputter, etc.


Spectroscopic ellipsometers - product overview
iSE brochure 2017
In situ iSE 2018


iSE JAW Booth
iSE Product Video


Gauthier Caby
Gauthier Caby

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Quantum Design S.A.R.L.

Avenue de l’Atlantique
Bâtiment Fuji Yama
91940 Les Ulis

Phone:+33 1 69 19 49 49
Gauthier CabyProduct Manager
01 69 19 49 49
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