Spectroscopic ellipsometers
Woollam Newsletter
Video - Woollam Co Ellipsometer
Spectroscopic ellipsometry is an optical technique for characterizing surfaces and thin layers. It measures the change in polarization of light after reflection by a material (or in transmission in the case of anisotropic samples). By analyzing this variation, we can deduce information from thin layers such as:
- Thickness
- Optical properties: ...
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Woollam Newsletter
Video - Woollam Co Ellipsometer
Spectroscopic ellipsometry is an optical technique for characterizing surfaces and thin layers. It measures the change in polarization of light after reflection by a material (or in transmission in the case of anisotropic samples). By analyzing this variation, we can deduce information from thin layers such as:
- Thickness
- Optical properties: refractive index (n) and absorption coefficient (k)
- Band gap
- Surface roughness
- Interface layer Composition (up to 3 materials)
- Crystallinity Anisotropy Uniformity
The J.A. Woollam company offers a large variety of spectroscopic ellipsometers to cover all applications. The VASE ellipsometer, based on a scanning monochromator, covers the widest spectral range available: from 140 nm to 4000 nm, making it a perfect instrument for research, just like the IR-VASE (1.7 µm to 35 µm). The instantaneous detection ellipsometers (CCD sensor) complete the range. With a single rotating compensator (M2000 and Alpha-SE) or double rotating compensator (iSE and RC2), these ellipsometers are ideal for ex-situ measurements (goniometer with manual or automated sample holders) as well as for in-situ applications (direct attachment to a deposition frame or through a liquid or environmental cell). This method is widely used in research and industry for the study of semiconductors, optical materials, and thin films in general. It is non-destructive, precise, and allows analysis over a wide spectral range, hence the term "spectroscopic".
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What is Ellipsometry? This brief introduction to ellipsometry is targeted to the novice and provides a fundamental description of ellipsometry measurements and typical data analysis procedures. The ...
Spectroscopic ellipsometer alpha 2.0 is a fast, low-cost system for measuring film thickness and optical constants. Everything is contained in an amazingly small package. It is the ideal table top ...
The iSE is a new in-situ spectroscopic ellipsometer developed for real-time monitoring of thin film processing. Using our proven technology, the iSE enables users to optimize optical properties of ...
The theta-SE is a push-button spectroscopic ellipsometer for characterizing thin film uniformity. It features advanced ellipsometry instrumentation in a compact package at an affordable price.
The M-2000 ellipsometer combines highly accurate 'rotating compensator' method with fast CCD technology. This allows high speed measurements: min. 390 wavelengths in < 1 second. It is available as ...
The RC2 is the first spectroscopic ellipsometer with two rotating compensators. It combines the best features of previous instruments with innovative new technology: dual rotating compensator, ...
The VASE is our most accurate and versatile ellipsometer for research on all types of materials: semiconductors, dielectrics, polymers, metals, multi-layers and more.
The IR-VASE is the first and only spectroscopic ellipsometer to cover the spectral range from 1.7 to 30 microns (333 to 5900 wavenumbers). The IR-VASE can determine both n and k for materials over the ...
The VUV-VASE variable angle spectroscopic ellipsometer is the standard in optical characterization of materials used in lithography applications. Its measurement range spans vacuum ultraviolet (VUV) ...
T-Solar, a special intensity optimized M-2000, addresses the measurement requirements on textures Si wafer surfaces.
