Photolithography systems

MicroWriter from Durham Magneto Optics (DMO)

The MicroWriter 3 Pro is a direct-write photolithography system. It is flexible and powerful and offers everything you need for high resolution combined with fast processing.

MicroWriter 3 Baby is the smallest optical lithography machine in the world and is offered at an affordable price.

Features

High resolution
Fast writing speed
Easy-to-use
Cost effective
Flexible configuration

Further information

The MicroWriter 3 Pro works with a 385 nm photo diode which can be used for g-, h- and i-line resists (positive and negative and SU-8). The system provides four different resolutions which easily can be switched via the software (0.6 µm, 1 µm, 2 µm and 5 µm). As an option you can add 0.4 µm resolution. MicroWriter 3 Pro includes an optical profilometer and a wafer inspection tool.

Additionally one can add a 405 nm or 365 nm photo diode or the backside alignment option to the system.

The baby, the baby plus and the Mesa system are using a 405 nm diode as standard which can be change with a 385 nm or 365 nm.

Each system can be upgraded to the next level at any later stage which makes the MicroWriter family the most flexible direct write lithography platform in the market.

Specifications

Microwriter Specification	ML3 Baby	ML3 Baby Plus	ML3 Mesa	ML3 Pro
Maximum substrate size [mm]	155 x 155 x 7	155 x 155 x 7	155 x 155 x 7	230 x 230 x 15
Maximum writing area [mm]	149 x 149	149 x 149	149 x 149	195 x 195
Exposure resolutions [µm]	1	1 and 5	0.6, 1, 5	0.6, 1, 2, 5 (0.4 as option)
Surface tracking autofocus system	Yes	Yes	Yes	Yes
Greyscale lithography	Yes	Yes	Yes	Yes
Alignment microscope objectives	x10	x3 and x10	x3, x10, x20	x3, x5, x10, x20 (x50 as option)
Automatic lens changer for exposure resolution and alignment microscope	No	Yes	Yes	Yes
Backside alignment	No	No	No	Available as option
Exposure wavelength [nm]	405 (385 and 365 as option)	405 (385 and 365 as option)	405 (385 and 365 as option)	385 (365 nm as option)
Maximum writing speed	50 mm²/minute at 1 µm	50 mm²/minute at 1 µm 180 mm²/minute at 5 µm	17 mm²/minute at 0.6 μm, 50 mm²/minute at 1 μm 180 mm²/minute at 5 μm	17 mm²/minute at 0,6 µm, 50 mm²/minute at 1 µm, 120 mm²/minute at 2 µm , 180 mm²/minute at 5 µm
Overlay alignment accuracy at best resolution [µm]	±2	±1	±1	±0,5
Minimum addressable grid [nm]	200	200	100	100
Motion stage minimum XY step size [nm]	15	15	15	4
Optical surface profiler Z resolution [nm]	not applicalble	200	200	100
Automatic wafer inspection tool	No	Yes	Yes	Yes
Virtual mask aligner tool	No	Available as option	Available as option	Yes
Temperature stabilized enclosure	No	Available as option	Available as option	Yes
Supplied with vibration isolating optical table	No	No	No	Yes
Mask design software	Open source KLayout supplied. Clewin available as option	Open source KLayout supplied. Clewin available as option	Open source KLayout supplied. Clewin available as option	Clewin supplied
Can be upgraded?	Yes	Yes	Yes	No