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Our partner Quorum

Sputter Coater with large sample chamber

Q300T Plus-Series from Quorum Technologies

The Q300T Plus series are fully automated, modular coating systems with large vacuum chambers for applying fine-grained films for SEM, TEM and thin-film technology. The Q300T Plus can be acquired as a sputter coater with three targets (TT), with two targets for sequential deposition (TD) or as combined system for sputter coating, as well carbon and metal evaporation (TES).

Features
  • Fully automated coating process
    (incl. download of process log files in .csv format via USB)
  • Built-in turbo pump, vacuum down to 5 x 10-5 mbar
  • Extra-large sample chamber:  300 mm Ø
  • Fast turnover times / coating cycles
  • Q300T T Plus: sputter coater with 3 targets
  • Q300T D Plus: sputter coater with 2 targets for sequential coating
  • Q300T ES Plus: combined system for sputter coating, carbon and metal evaporation

Further information

The Q300T Plus series is available in three configurations:

  • Q300T T Plus – Sputter coater for precious metals and oxidising metals with 3 targets, high vacuum, for coating samples with max. 20 cm diameter.
  • Q300T D Plus – Sputter coater for precious metals and oxidising metals with 2 targets for sequential coating of samples with max. 15 cm diameter, high vacuum.
  • Q300T ES Plus – Carbon, metal evaporation and sputter coating for precious metals and oxidising metals (interchangeable inserts) for coating samples with max. 15 cm diameter metal evaporation and 10 cm for sputtering and carbon evaporation, high vacuum.

The different head plates can easily be exchanged within seconds. The unit recognizes the replacement and the operating menu changes accordingly. A touch screen is used to enter coating parameters, display the coating sequence and show error messages. Multiple users can store up to 1000 recipes including all parameters. By awarding access rights, selected parameters can be protected against deletion and unauthorized modification. Only the administrator has access to all settings. A USB-port allows the download of recipes and process logs.

Several optional sample stages ensure the efficient and reproducible coating of samples within a wide range of geometries.

The fully automated process does not require tedious adjustment of a needle valve to control argon gas flow. Instead, the user can control the process vacuum, gas flow is adjusted automatically. Depending on the set gas value (vacuum), the voltage is adjusted accordingly and the desired sputter current (mA) is kept at a constant. This way, samples with strongly irregular topography can also be uniformly coated at low sputtering currents.

The glass chamber can be completely removed, granting easy access to the sample stage and facilitating the cleaning process.

Operating principle: magnetron sputtering
Magnetron sputter coaters (also referred to as "Cool Sputter Coaters") are equipped with a special magnet, which is located in the sputter head (cathode) near the target.

Benefits are:

  • electrons are available for ionization of further process gas ions
  • excessive heating is avoided
  • optimisation of the utilisable target surface

During sputter coating, a vacuum is produced in a vacuum chamber and a process gas, preferably argon, is continuously leaked into the chamber. Argon has an optimal ion size and does not chemically react with other molecules.

Within a vacuum window from approx. 1 x 10-1 mbar to 5 x 10-3 mbar, process gas atoms are ionized in an electrical field, which creates a plasma. Positively charged argon atoms are accelerated towards the magnetron head with the target (cathode) and erode target atoms, which reach all surfaces within the vacuum chamber, including the sample to be coated.

Specifications

Q300T T / D / ES Plus

Instrument case

590 mm B x 535 mm D x 420 mm H (total height with coating head open: 772 mm)

Weight

36.5 kg

Work chamber

Borosilicate glass 300 mm OD x 127 mm H

Safety shield

Polyethylene terephthalate (PET) – cylinder

Display

115.5 mm x 86.4 mm (active area) capacitive touch colour display

User interface

Intuitive full graphical interface with touch screen buttons, includes log of the last 1000 processes and USB-port.

Sputter target

Q300T T Plus – incl. 3 chromium targets

Q300T D Plus – incl. 1 chromium and 1 gold target

Q300T ES Plus – incl. 1 chromium target

Vacuum

Turbomolecular pump

Internally mounted, 70 l/s air-cooled

Rotary pump

50 l/min. two-stage rotary pump with oil mist filter (order separately, see AG-DS102)

Vacuum measurement

Pirani gauge as standard. A full range gauge (10428) is available as an option

Typical ultimate vacuum

∼5x10-5 mbar in a clean system after pre-pumping with dry nitrogen gas

Sputter vacuum range

Between 5x10-3 and 5x10-2 mbar

Specimen stage

50 mm Ø rotation stage. Rotation speed 8-20 RPM. For alternative stages see options and accessories

Applications

Sputtering

0–150 mA to a pre-determined thickness (with optional FTM) or by the built-in timer. The maximum sputtering time is 60 minutes (without breaking vacuum and with built in cooling periods).

Q300TT Plus – 3 magnetron heads for evenly coating large surfaces up to 20 cm Ø

Q300TD Plus – 2 magnetron heads for sequentially coating with 2 different materials without breaking vacuum

Q300TES Plus – 1 magnetron head for evenly coating large surfaces up to 10 cm Ø

Carbon evaporation

(only Q300T ES Plus)

A robust, ripple free DC power supply featuring pulse evaporation or ensures reproducible carbon evaporation from rod or fibre sources. Current pulse: 1–90 A

Metal evaporation (only Q300T ES Plus)

For thermal evaporation of metals from filaments or boats for evenly coating surfaces up to 15 cm Ø

Further Information

Gases

Argon sputtering process gas, 99.999%

Electrical supply

90–250 V 50/60 Hz 1400 VA including rotary pump power. 110/240 V voltage selectable.

Conformity

CE conformity: Power factor correction. Complies with the current legislation (CE Certification) and ensures efficient use of power, which means reduced running costs

Options and accessories

10596

Extended height vacuum chamber (214 mm h x 283 mm Ø), recommended to increase distance target/sample surface.

AL410-414

Nine-place TEM grid holder

12996
(only with Q300T ES Plus)

Additional sputter insert for quick metal change (TE and TES versions only). NB: This is an entire sputtering assembly; individual targets can also be purchased.

10067

Standard stage with six stub positions for 15 mm or 6.5 mm or 1/8" pin stubs.

10788

4” stub holder to accept up to 18 1/8 pin stubs

10360

50 mm Ø rotary tilting stage. A rotary planetary style stage with variable tilt angle from horizontal to 30°. The platform has six positions for either 15 mm, 10 mm, 6.5 mm disc stubs or 1/8" pin stubs. Rotation speed is variable between pre-set limits. NB: Depending on specimen height, this stage may require the optional extended height cylinder.

10357

Rotate-tilt stage with six stub positions for 15 mm or 6.5 mm or 1/8" pin stubs, tilts up to 90° horizontally.

10358

Microscope slide stage for up to two 75 mm x 25 mm slides or eight stub positions for pin stubs.

12043

A stage to accept 9 20 x 20 cover slips. The top part of stage lifts off and has a mechanism to lift the cover slips for easy removal.

12305

4 Place 25 mm stub stage with locking screws. May be fitted to 10360 “RotaCota” stage.

10808

8 places for 25 or 30 mm polished embedded samples. Includes a polished brass tally.

11856

14 places for 25 or 30 mm polished embedded samples. Includes a polished brass tally.

10787

Adjusts to accept 2”, 3” & 4” wafers, comes with a 4” stub holder to accept up to 18 1/8 pin stubs.

10810

Adjusts to accept 4” & 6" wafers comes with 10882, a 6” stub holder to accept up to 27 1/8 pin stubs.

10882

A 6” stub holder to accept up to 27 1/8 pin stubs.

10428

Coating shield assembly. Shields can be fitted to protect large surfaces from coating deposition, easily removable for ease of cleaning

10994 (only with Q300T D Plus)

Rotating specimen stage to accept 4"/100 mm or 6"/150 mm wafers, with rotation variable between pre-set limits.

10779 (only with Q300T D Plus)

2 Film thickness monitors including oscillators, feed-through, quartz crystal holder and two C5460 quartz crystal.

10454 (only Q300T ES Plus)

Film thickness monitor including oscillator, feed-through, quartz crystal holder and one C5460 quartz crystal.

11520 (only with Q300T T Plus)

Film thickness monitor (FTM) attachment. Including oscillator, feed-through, quartz crystal holder and one C5460 quartz crystal.

12937 (only with Q300T ES Plus)

Conductance film monitor (CFM) attachment including housing, feedthrough, glass slides and cable. A factory fitted only option for monitoring sheet resistance of evaporated films allowing termination at a known resistance.

12624 (only with Q300T T Plus)

Stage to accept 6” square wafer or masks.

Applications

Thermal evaporation of thin carbon layers Thin carbon layers are evaporated onto non-conductive samples in electron microscopy for applications like EDX or WDX to prevent charging of the sample. Carbon has a low x-ray absorption, assuring better detection of x-rays than with metal coatings.
Deposition of thin metal layers Sputter coaters are used to deposit a thin metal layer on the surface of a sample/substrate. For electron microscopy applications, electrically conductive films need to be deposited on non-conductive surfaces, to prevent electrons from the microscope's electron beam from accumulating on the sample surface, causing the latter to become charged. Such a charge would prevent imaging of these surfaces with the SEM. The desired films should be extremely thin, but electrically conductive, with a thickness of 3 - 20 nm.
Use of sputter coaters for thin-film applications Sputter coaters can also be used for other thin-film applications such as the application of an electrically conductive film on glass capillaries or other surfaces, the creation of metallic multi-layer systems or the defined coating of specific probes such as cantilevers.
Advantages of sputter coating and evaporating in high vacuum Chromium or high-vacuum sputter coaters have become more established in the past few years. Their advantages are a virtually “clean” vacuum, due to the application of a turbomolecular pump, and a powerful magnetron head, capable of removing the oxide layer on the target material. Sputter currents as high as 150 – 200 mA enable the highly efficient removal of oxide layers on oxidising targets. Rotary pumped sputter coaters do not support sputtering of oxidising metals. The deposition of carbon films also benefits from lower pressure in the work chamber. Under high-vacuum conditions, very thin, amorphous carbon layers can be produced. These can be used as sample support films or to create surface replicas for TEM applications.

Downloads

Q Plus Series brochure
Sputter coater Q300T D Plus specification
Sputter coater Q300T T Plus specification

Contact

Dr. Andreas Bergner
Dr. Andreas Bergner
Anne Kast
Anne Kast

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Contact

Quantum Design GmbH

Breitwieserweg 9
64319 Pfungstadt
Germany

Phone:+49 6157 80710-0
Fax:+49 6157 807109
E-mail:germanyqd-europe.com
Dr. Andreas BergnerProduct Manager - Electron microscopy & nanotechnology
+49 6157 80710-12
Write e-mail

Anne KastProduct Manager - Electron microscopy
+49 6157 80710-456
Write e-mail